Reticle Analysis – Help Rectify your Yield
Reticle-induced contamination, derived from the photolithographic masks in wafer fabrication and replicated across a wafer, can have a significant negative effect on yield in semiconductor manufacturing. Contamination on a reticle during manufacturing can be disastrous, because a defective reticle can create a defect in every single die generated by the reticle and replicated across the wafer.
A first class yield management tool should allow the user to stack reticles for analysis of such behavior. Bin and parametric behavior should be analyzable across a reticle.
In FloorVision, the state of the art yield management system by Mfg Vision, one product expert in your company can set the reticle and all other users can analyse using that stored reticle. Some products will have assembly reticles so multiple reticles per product are not unusual and are supported.
For statistical significance, the more wafers analysed together the better. In FloorVision hundreds of wafers, sometimes equivalent to many Gigabytes of raw data, can be analysed for reticle-induced defects in seconds, even on a smart phone.
The on-line sharing of such analysis between fabless company and foundry (or vice versa) are instantaneous with FloorVision. Accelerated review of this yield hazard is critical as dimensions reduce in semiconductor wafer foundries.